发明名称 CHEMICAL SUPPLY DEVICE AND SUPPLY METHOD THEREOF
摘要 PURPOSE: A chemical supply device is provided to maintain supply pressure of chemical into normal pressure by reducing an error of set pressure and inner pressure of a process canister. CONSTITUTION: A chemical supply device includes a push and purge gas supply part(30), a bulk canister(10), a process canister(20), and a pressure control part(50). The push and purge gas supply part supplies a push gas and a purge gas for providing supply pressure of chemical. The bulk canister stores the chemical. The process canister receives and stores the chemical from the bulk canister through a refill part. The pressure control part exhausts an air inside the canister or the purge gas to outside.
申请公布号 KR20090106798(A) 申请公布日期 2009.10.12
申请号 KR20080032161 申请日期 2008.04.07
申请人 K.C.TECH CO., LTD. 发明人 JUNG, KEN JUN;LEE, SEUNG SEUB;JUNG, DONG JIN
分类号 H01L21/02;H01L21/00 主分类号 H01L21/02
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