发明名称 WAFER BONDING METHOD AND BONDED WAFER STRUCTURE USING THE SAME
摘要 <p>PURPOSE: A wafer bonding method is provided to improve throughput by performing a manufacturing process of many insulation wafers at a time. CONSTITUTION: A conductive wafer and a plurality of insulation wafers are provided(S10). A size of the conductive wafer is larger than a size of the insulation wafer. At least one of the conductive wafer and the insulation wafer is pre-treated(S20). The pre-treatment is a plasma treatment or a wet treatment. The conductive wafer and the insulation wafers are directly bonded(S30). A dangling bond is formed on a bonding surface of the wafer in which the pre-treatment is performed.</p>
申请公布号 KR20090106822(A) 申请公布日期 2009.10.12
申请号 KR20080032193 申请日期 2008.04.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, SANG JOON;KIM, KYOUNG KOOK;KIM, YU SIK
分类号 H01L21/20;H01L21/02;H01L33/00;H01L33/34 主分类号 H01L21/20
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