发明名称 |
WAFER BONDING METHOD AND BONDED WAFER STRUCTURE USING THE SAME |
摘要 |
<p>PURPOSE: A wafer bonding method is provided to improve throughput by performing a manufacturing process of many insulation wafers at a time. CONSTITUTION: A conductive wafer and a plurality of insulation wafers are provided(S10). A size of the conductive wafer is larger than a size of the insulation wafer. At least one of the conductive wafer and the insulation wafer is pre-treated(S20). The pre-treatment is a plasma treatment or a wet treatment. The conductive wafer and the insulation wafers are directly bonded(S30). A dangling bond is formed on a bonding surface of the wafer in which the pre-treatment is performed.</p> |
申请公布号 |
KR20090106822(A) |
申请公布日期 |
2009.10.12 |
申请号 |
KR20080032193 |
申请日期 |
2008.04.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, SANG JOON;KIM, KYOUNG KOOK;KIM, YU SIK |
分类号 |
H01L21/20;H01L21/02;H01L33/00;H01L33/34 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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