发明名称 DOPING TECHNIQUES FOR GROUP ?????? COMPOUND LAYERS
摘要 A method of forming a doped Group IBIIIAVIA absorber layer for solar cells by reacting a a metallic precursor layer with a dopant structure. The metallic precursor layer including Group IB and Group HIA materials such as Cu, Ga and In are deposited on a base. The dopant structure is formed on the metallic precursor layer, wherein the dopant structure includes a stack of one or more Group VIA material layers such as Se layers and one or more a dopant material layers such as Na.
申请公布号 KR20090106513(A) 申请公布日期 2009.10.09
申请号 KR20097014297 申请日期 2007.12.03
申请人 发明人
分类号 H01L31/0445;H01L31/0749 主分类号 H01L31/0445
代理机构 代理人
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