发明名称 METHOD OF ADJUSTING FLAW DETECTION LEVEL AND FLAW INSPECTION SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of adjusting flaw detection level to reduce the member of the working processes of flaw inspection by an actual machine and to enhance the throughput of a flaw inspection device, and to provide a flaw inspection system. Ž<P>SOLUTION: In the method of adjusting flaw detection level, a high-sensitivity parameter is set with respect to a flaw detection algorithm by the flaw inspection device: after actual detection data is acquired, the resetting of the sensitivity parameter and the acquirement of a simulation detection data and/or the formation of review data are repeated on an off-line with respect to the flaw inspection device until a predetermined detection level is achieved. The flaw inspection system capable of executing this adjusting method is also disclosed. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009229218(A) 申请公布日期 2009.10.08
申请号 JP20080074377 申请日期 2008.03.21
申请人 NUFLARE TECHNOLOGY INC 发明人 SAITO YASUKO;WATANABE TOSHIYUKI;MATSUNO YOSHIYUKI
分类号 G01N21/956;G01B11/30;H01L21/66 主分类号 G01N21/956
代理机构 代理人
主权项
地址