发明名称 METHOD AND APPARATUS FOR PURGING GASIFICATION FACILITY
摘要 PROBLEM TO BE SOLVED: To provide a gasification facility which can safely be purged at low cost. SOLUTION: The method for purging the gasification facility comprises supplying a raw material 10 and steam S' to a fluidized layer gasification oven 2 to gasify the raw material 10, guiding the gasified gas 14 produced in the fluidized layer gasification oven 2 to a spray tower 18 to cool the gas, and then guiding the cooled gas to a downstream device 22 equipped with an inducing fan 21, characterized by purging a gas with steam S' in the fluidized layer gasification oven 2 in a state operating the spray tower 18, and supplying an inactive gas 32 in an amount capable of replacing a gas in the downstream device 22 to the entrance of the spray tower 18 to purge the downstream device 22 with the inactive gas 32. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009227879(A) 申请公布日期 2009.10.08
申请号 JP20080076991 申请日期 2008.03.25
申请人 IHI CORP 发明人 KATAGIRI TOMOYUKI;NUKUMI HISANORI
分类号 C10J3/00;C10J3/54 主分类号 C10J3/00
代理机构 代理人
主权项
地址