发明名称 MICRO-MECHANICAL ELEMENT AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To suppress the lowering of Q value and a resonance frequency of oscillation by forming a movable structure operating (oscillating) mechanically into a state supported at a high mechanical strength. SOLUTION: A base plate 101 is etched by emitting reactive ions 104 to the base plate 101 from a first direction, which is in parallel to a plane perpendicular to the plane of the base plate 101 including the boundary from an exposed portion of the base plate 101 of a base pattern 103b to form a first space 111 on the base plate 101 from a first side perpendicular to the extension direction of a stripe pattern 103a. The first direction is defined to a predetermined angle toward the normal line of the plane of the base plate 101 in a side of the stripe pattern 103a extending to the central part. For example, the reactive ions 104 are incident on the base plate 101 at 45°with respect to the normal line. This method can form the first space 111 towards the lower part of the stripe pattern 103a. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009226489(A) 申请公布日期 2009.10.08
申请号 JP20080070930 申请日期 2008.03.19
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 YAMAZAKI KENJI;VIJAY KUMAR SINGH;YAMAGUCHI KOJI
分类号 B81C1/00;B81B3/00 主分类号 B81C1/00
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