SUBSTRATE PROCESSING APPARATUS

摘要

<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that prevents particles from being accumulated in a holding groove of a holding portion of a substrate holding means. Ž<P>SOLUTION: The substrate processing apparatus includes: a processing tank for storing a processing liquid; a substrate holding tool which has a first holding portion 20 and second/third holding portions for holding a lowest end portion and each lower end portion of both sides of a plurality of substrates perpendicularly disposed in a horizontal direction and which holds the plurality of the substrates in the processing tank; and a pair of discharge pipes for discharging the processing liquid from the discharge pipes disposed in the vicinity of a bottom portion of the processing tank. Further, a plurality of through-hole pores 20b penetrated from a bottom of the holding groove 20a to a side surface of the holding portion are drilled to be disposed in the first holding portion 20 and second/third holding portions in a direction along a flow of the processing liquid generated in the processing tank. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž