| 摘要 |
<P>PROBLEM TO BE SOLVED: To stabilize a supply amount of material gas in manufacturing a semiconductor device. Ž<P>SOLUTION: A flow-controlled carrier gas is introduced to a raw material vessel 1, a pressure measuring instrument 7 for measuring the pressure of a gas line 5 connected from a raw material vessel 1 to a reactive chamber 2 and a pressure control valve 3 are provided at the downstream to a gas line 5, and the pressure of the gas line 5 is automatically controlled with the pressure measurement value of the gas line 5 fedback to the opening and closing degree of the pressure control valve 3. Further, a mechanism for arbitrarily controlling the opening and closing degree of the pressure control valve 3 can be provided to arbitrarily switch the state for automatically controlling the pressure of the gas line 5 in the process of a series of growth of the semiconductor layer and the state for arbitrarily controlling the opening and closing degree of the pressure control valve 3. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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