| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate inspection apparatus capable of reliably detecting minute linear flaws extended along all directions. SOLUTION: The substrate inspection apparatus for inspecting foreign matters on a substrate 30 comprises an illumination system 1 for applying light to the substrate, and an imaging system 2 for performing dark field observation of a region on the substrate irradiated by the illumination system. The illumination system irradiates a region on the substrate with luminous flux so that the side surface of a cone with an optical axis AX2 of the imaging system as a center is drawn. The illumination system has a plurality of illumination units 1a, 1b. The plurality of illumination units are rotated and moved integrally with the optical axis of the imaging system as a center so that the optical axis AX1 of each illumination unit draws the side surface of the cone with the optical axis of the imaging system as a center. COPYRIGHT: (C)2010,JPO&INPIT
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