| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: an apparatus which can remove droplets and/or a thin film from the surface of a substrate more effectively, and a gas knife device improved in performance. <P>SOLUTION: In an immersion lithographic apparatus, for instance, a droplet removing device uses an inclined gas flow from a gas knife during exposure to remove droplets from the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT |
