| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for a resist underlayer film, the composition having excellent adhesion to a resist film, improving reproducibility in a resist pattern, having resistance to an alkaline solution used for development or the like and to oxygen ashing at the resist removal, and having excellent storage stability, wherein the resist underlayer film into which the resist material is less likely to soak can be formed. <P>SOLUTION: The composition for the resist underlayer film includes: a polysiloxane containing a constituent unit expressed by the general formula (1); and a solvent, wherein X is an optionally substituted methylene group or an optionally substituted and linear or branched 2-5C alkylene group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
