发明名称 DOUBLE REFRACTION MEASURING INSTRUMENT, DOUBLE REFRACTION MEASURING METHOD, FILM PRODUCING SYSTEM AND FILM PRODUCING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To accurately measure the double refraction characteristics of a film in a manufacturing process to feed back the same to a process condition. <P>SOLUTION: The water content of a sample 16 is measured by a water content measuring part 81, the thickness of the sample 16 is measured by a thickness measuring part 82 and the double refraction characteristics of the sample 16 are measured by a first polarization characteristics measuring part 11 and a second polarization characteristics measuring part 17. An axis/retardation calculating means 61 calculates the retardation of the sample 16 from the measuring results of the first and second polarization characteristics measuring parts 11 and 17. Further, the water content measured by the water content measuring part 81 is standardized on the basis of the thickness value measured by the thickness measuring part 82, and a preliminarily calculated correlation formula of the water content and the retardation is used to correct the calculated retardation. The double refraction characteristics are fed back to the process condition on the basis of the calculated retardation. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009229278(A) 申请公布日期 2009.10.08
申请号 JP20080075733 申请日期 2008.03.24
申请人 FUJIFILM CORP 发明人 SHIGETA BUNGO;IKEHATA KOSUKE;INAMURA TAKAHIRO
分类号 G01N21/23;C08J5/18;G01M11/00;G01N21/3559 主分类号 G01N21/23
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