| 发明名称 |
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which enables to form a resist pattern of good shape and a resist pattern forming method. <P>SOLUTION: The resist composition includes a base component (A) whose solubility in an alkali developer changes by the action of an acid and an acid generator component (B) which generates an acid upon irradiation with radiation, wherein the acid generator component (B) includes an acid generator (B1) represented by general formula (b1) and an acid generator (B2) represented by general formula (b2). <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2009230026(A) |
申请公布日期 |
2009.10.08 |
| 申请号 |
JP20080077989 |
申请日期 |
2008.03.25 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
MOTOIKE NAOTO;HAYASHI TOMOHIKO;KAKINOYA YASUHIKO |
| 分类号 |
G03F7/004;C08F220/28;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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