| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coiling type vacuum deposition method and a device therefor, wherein charging troubles of a film base material are suppressed as much as possible when electron beam deposition is performed while avoiding the problems of the drastic remodeling of existing equipment, the cost increase of device, the large scale thereof or the like, and a stable film deposition operation free from damages is performed. Ž<P>SOLUTION: This invention relates to the coiling type vacuum deposition method and device, wherein permanent magnets are arranged at the inside of a film deposition drum in the vicinity at which a film base material is adhered to the film deposition drum and at the inside of the film deposition drum in the vicinity at which the film base material is peeled from the film deposition drum, respectively, and the counter electrode of the film deposition drum is used as the outer wall of the chamber to apply a high frequency potential of 40 to 100 KHz to the film deposition drum. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
|
