发明名称 PATTERN DATA CREATING METHOD, PATTERN DATA CREATING PROGRAM AND MEDIUM INCLUDING THE PROGRAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a photo mask pattern data creating method for efficiently selecting a cell conducting OPC (Optical Proximity Correction) processing and specifying a cell considered to be equivalent to the cell. <P>SOLUTION: This method of creating pattern data to a pattern of a photo mask includes processes of: adding information of a first cell as a high order for every first cell based on a hierarchical structure; constituting a cell group composed of a first cell which is the same as the first cell belonging to a high order hierarchy and a first cell disposed on the first cell which are two or more on the high order hierarchy right above the one hierarchy out of the first cells belonging to one hierarchy; creating pattern data in consideration of optical proximity effect to the first cell belonging to the above cell group and composing the fourth cell group using the second cell including the pattern data; and replacing the first cell with the corresponding second cell in input data. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009229623(A) 申请公布日期 2009.10.08
申请号 JP20080072869 申请日期 2008.03.21
申请人 FUJITSU MICROELECTRONICS LTD 发明人 SAITO MUNEHITO;SUZUKI KOICHI;SAKURAI MITSUO;NAGASE NORIMASA
分类号 G03F1/36;G03F1/68;G03F1/70;H01L21/027;H01L21/82 主分类号 G03F1/36
代理机构 代理人
主权项
地址