| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a reflective mask blank comprising at least a substrate, a multilayer reflecting film for reflecting exposure light, and an absorber for absorbing the exposure light, the absorber having a smaller film thickness for preventing the degradation of resolution and misregistration around a pattern during exposure and for improving a contrast to inspection light, and to provide a reflective mask. <P>SOLUTION: The reflective mask blank has the absorber having a structure comprising three or more layers with a second layer 205 sandwiched between a first layer 206 and a third layer 204, a value of an extinction coefficient that the second layer has to exposure light being equal to or smaller than a value of an extinction coefficient that the first layer has to the exposure light and smaller than a value of an extinction coefficient that the third layer has to the exposure light, and a value of an extinction coefficient that the first layer has to the inspection light having a longer wavelength than the exposure light being is smaller than a value of an extinction coefficient that the second layer has to the inspection light having the longer wavelength than the exposure light. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
