发明名称 FIELD EFFECT TRANSISTOR AND METHOD OF MANUFACTURE
摘要 A semiconductor structure and method of manufacture and, more particularly, a field effect transistor that has a body contact and method of manufacturing the same is provided. The structure includes a device having a raised source region of a first conductivity type and an active region below the raised source region extending to a body of the device. The active region has a second conductivity type different than the first conductivity type. A contact region is in electric contact with the active region. The method includes forming a raised source region over an active region of a device and forming a contact region of a same conductivity type as the active region, wherein the active region forms a contact body between the contact region and a body of the device.
申请公布号 US2009250772(A1) 申请公布日期 2009.10.08
申请号 US20080099175 申请日期 2008.04.08
申请人 BOTULA ALAN B;JOSEPH ALVIN J;LUCE STEPHEN E;PEKARIK JOHN J;SHI YUN 发明人 BOTULA ALAN B.;JOSEPH ALVIN J.;LUCE STEPHEN E.;PEKARIK JOHN J.;SHI YUN
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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