发明名称 Exposure apparatus and exposure method
摘要 An exposure image is accurately projected. An exposure apparatus includes a light source for emitting exposure light, a DMD, which includes a plurality of two-dimensionally-arranged pixel portions, and a telecentric optical system for collimating principal rays of the exposure light. The telecentric optical system is positioned in an optical path of the exposure light that enters the DMD. The DMD performs, based on an image signal, spatial light modulation on exposure light, which has been emitted from the light source, and that has entered the plurality of pixel portions, for each of the plurality of pixel portions.
申请公布号 US2009251676(A1) 申请公布日期 2009.10.08
申请号 US20060921406 申请日期 2006.05.30
申请人 KOMORI KAZUKI;ISHIKAWA HIROMI;OMORI TOSHIHIKO;OKAZAKI YOJI;BABA TOMOYUKI 发明人 KOMORI KAZUKI;ISHIKAWA HIROMI;OMORI TOSHIHIKO;OKAZAKI YOJI;BABA TOMOYUKI
分类号 G03B27/72 主分类号 G03B27/72
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