DEFECT CORRECTION DEVICE, DEFECT CORRECTION METHOD AND METHOD FOR MANUFACTURING PATTERNED SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a defect correction device and method for reliably correcting a defect, and also to provide a method for manufacturing a patterned substrate.

SOLUTION: The defect correction device is equipped with: correction optics 20 for irradiating a defective part of a sample with a laser beam through an objective lens 43; and illumination optics 50 for irradiating and illuminating the sample with a laser beam at the same wavelength as the above laser beam through the objective lens 43 to observe the sample 70, wherein the illumination optics 50 has a homogenizing part 65 for homogenizing the spatial distribution of a laser beam.

COPYRIGHT: (C)2010,JPO&INPIT