发明名称 SPUTTERING FILM DEPOSITION APPARATUS AND SPUTTERING FILM DEPOSITION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To solve the following problem in film deposition using a rotary drum such as a carrousel, that an extremely fine eccentricity between a rotary shaft of the carrousel and a bearing of an apparatus body exerts an influence on a variation in the characteristics of a product. Ž<P>SOLUTION: In a carrousel type sputtering film deposition apparatus, a cylindrical or polygonal drum is rotatably provided inside a chamber 3 being a chamber, each substrate holder 9 for housing each substrate 10 is attached on the outer circumferential surface of the drum, and a film is deposited on each substrate 10 while rotating the drum around a vertical rotary shaft. The apparatus is provided with: targets 7, 8 provided on the inner wall of the chamber 3 being the chamber and depositing a film on each substrate 10; and an eccentricity measuring device 13 for measuring the eccentricity quantity of the rotary drum by measuring the distance between each target and each substrate 10 at the position at which each substrate holder 9 is confronted with the targets 7, 8 in front, and the apparatus corrects the target electric power according to each substrate target by the output from the eccentricity measuring device 13. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009228062(A) 申请公布日期 2009.10.08
申请号 JP20080074907 申请日期 2008.03.24
申请人 PANASONIC CORP 发明人 AONO AKIFUMI;NAGASAWA DAISUKE
分类号 C23C14/34;G02B5/26;G02B5/28 主分类号 C23C14/34
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