发明名称 |
FORMING REVERSE ILLUMINATION PATTERNS |
摘要 |
In photolithographic exposure, the illumination pattern (120R) formed on a photosensitive surface (106) is a reverse of the pattern (130) on the optical mask (124). The reverse pattern (120R) is obtained using off-axis illumination when the photosensitive surface is at other than the best focus position.
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申请公布号 |
US2009253079(A1) |
申请公布日期 |
2009.10.08 |
申请号 |
US20080098845 |
申请日期 |
2008.04.07 |
申请人 |
ZHANG FENGHONG;ZHANG XINYU |
发明人 |
ZHANG FENGHONG;ZHANG XINYU |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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