| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reticle flaw inspection device capable of detecting the positional shift flaw of an isolated pattern, and a reticle flaw inspection method. Ž<P>SOLUTION: In the aligning means 13a of a detection part 13, the alignment of an optical image acquired by TDI sensors 11a and 11b with a reference image produced by a reference image producing part 15 is performed at every frame wherein the striplike stripe of a reticle 2 is finely divided. In an allowable range calculation means 13c, the aligning quantity corresponding to one stripe is subjected to primary regression to calculate the reference aligning quantity corresponding to one stripe. In a positional shift flaw detection means 13d, the pattern of the frame, wherein the aligning quantity is differentiated from the reference aligning quantity by a predetermined value or above, is detected as the positional shift flaw of the pattern. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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