发明名称 COATING DEVICE AND COATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a coating device capable of controlling thermal polymerization reaction on a side wall of a coating container to suppress the formation of an organic film and improving deterioration in the quality and the manufacturing yield of the organic film caused by the generation of a particle, while enhancing the operating efficiency of a material monomer accompanied with it. SOLUTION: An external heater 14 arranged along a side wall of a coating container 11 heats the side wall of the coating container 11 to a temperature over the evaporating temperature of the material monomer used for the formation of an organic film. An internal heater 13 arranged separately from the external heater 14 and disposed close to a substrate support container 12 mounted with a substrate heats the substrate to a thermal polymerization reaction temperature of the material monomer. The material monomer is supplied in the coating container 11, and the organic film is formed by thermal polymerization on the substrate. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009231783(A) 申请公布日期 2009.10.08
申请号 JP20080078814 申请日期 2008.03.25
申请人 TOKYO ELECTRON LTD 发明人 NAKAO MASARU;HARADA MUNEO
分类号 H01L21/31;C23C14/12;C23C14/54 主分类号 H01L21/31
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