| 摘要 |
PROBLEM TO BE SOLVED: To provide detergent for lithography capable of suppressing the CD shift and the deterioration of cross-sectional perpendicularity without hindering the effect of the surfactant for preventing pattern collapse, and a method for forming a pattern using this detergent. SOLUTION: The detergent for lithography contains quaternary amine compound (a), a surfactant (b), and water. The detergent for lithography is caused to contact a resist pattern formed in the resist pattern forming process. COPYRIGHT: (C)2010,JPO&INPIT |
