| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of efficiently conveying a substrate at a processing section. Ž<P>SOLUTION: A coating block Bc, a development block Bd, and an IF section 5 are provided adjacently. Further, a first bypass block Bb1 is provided, which conveys a substrate W from the coating block Bc to the IF section 5 without passing through the development block Bd. In such an apparatus, the substrate W passing through the development block Bd is limited to only the substrate W traveling from the IF section 5 to the side of the coating block Bc, thus efficiently conveying the substrate W in the development block Bd. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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