发明名称 FERROELECTRIC MATERIAL, FERROELECTRIC CAPACITOR, AND SEMICONDUCTOR MEMORY
摘要 <P>PROBLEM TO BE SOLVED: To provide a ferroelectric material including a bismuth element allowing a small amount of leak current and a large amount of self-polarization, a ferroelectric capacitor utilizing the ferroelectric material, and a highly integrated semiconductor memory utilizing the ferroelectric capacitor. Ž<P>SOLUTION: The ferroelectric capacitor includes a first electrode 10, a ferroelectric material film 12 formed on the first electrode 10 and includes a mixed crystal of a first ferroelectric material formed of the Perovskite oxide including the bismuth element and a second ferroelectric material formed of the Perovskite oxide showing anti-ferroelectric property, and a second electrode 14 formed on the ferroelectric material film 12. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009231345(A) 申请公布日期 2009.10.08
申请号 JP20080071631 申请日期 2008.03.19
申请人 FUJITSU LTD 发明人 SATO KEISUKE;KURIHARA KAZUAKI;MARUYAMA KENJI
分类号 H01L21/8246;H01L21/822;H01L21/8242;H01L27/04;H01L27/105;H01L27/108 主分类号 H01L21/8246
代理机构 代理人
主权项
地址