发明名称 DUAL GATE LATERAL DIFFUSED MOS TRANSISTOR
摘要 <p>A disclosed power transistor (150), suitable for use in a switch mode converter (200, 300) that is operable with a switching frequency exceeding, for example, 5 MHz or more, includes a gate dielectric layer (110) overlying an upper surface of a semiconductor substrate (101) and first and second gate electrodes (121, 122) overlying the gate dielectric layer (110). The first gate electrode (121) is laterally positioned overlying a first region (104) of the substrate. The first substrate region (104) has a first type of doping, which may be either n-type or p-type. A second gate electrode (122) of the power transistor overlies the gate dielectric (110) and is laterally positioned over a second region (106) of the substrate. The second substrate region (106) has a second doping type that is different than the first type. The transistor further includes a drift region (131) located within the substrate (101) in close proximity to an upper surface (111) of the substrate and laterally positioned between the first and second substrate regions (104, 106).</p>
申请公布号 WO2009123787(A1) 申请公布日期 2009.10.08
申请号 WO2009US33181 申请日期 2009.02.05
申请人 FREESCALE SEMICONDUCTOR INC.;YANG, HONGNING;ZUO, JIANG-KAI 发明人 YANG, HONGNING;ZUO, JIANG-KAI
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
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