ZnO-BASED TARGET, MANUFACTURING METHOD THEREFOR, METHOD FOR MANUFACTURING ELECTROCONDUCTIVE THIN FILM, AND ELECTROCONDUCTIVE THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a ZnO-based target which provides a transparent electroconductive film with low resistance, and can be manufactured by being sintered at a low temperature.

SOLUTION: The ZnO-based target includes 0.4 wt.% or less B2O3in addition to Ga2O3and/or Al2O3contained in a ZnO-based target. The method for manufacturing the ZnO-based target includes mixing a ZnO powder containing Ga and/or Al with a B2O3powder, calcining the mixture at 800 to 1,200°C, pulverizing the temporarily sintered body, press-forming the pulverized powder, and subsequently sintering the powder at 900 to 1,300°C.

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