发明名称 SUBSTRATE MOVING APPARATUS, SUBSTRATE CARRYING APPARATUS AND SUBSTRATE IMAGING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate moving apparatus capable of holding relative position relation between a substrate holding position and a substrate height position at an always fixed position by allowing the substrate holding position to smoothly follow position variation when carrying a substrate so that the holding position of the substrate is vertically varied and to provide a substrate carrying apparatus and a substrate imaging apparatus. SOLUTION: The substrate moving apparatus comprising a substrate holding mechanism and a substrate holding mechanism moving mechanism capable of moving the substrate holding mechanism in a flow direction is provided with a substrate holding mechanism/vertical movement mechanism capable of vertically moving the substrate holding mechanism and a vertical movement control means for performing vertical movement control for canceling vertical movement target weight against the substrate holding mechanism/vertical movement mechanism. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009231717(A) 申请公布日期 2009.10.08
申请号 JP20080077924 申请日期 2008.03.25
申请人 TOPPAN PRINTING CO LTD 发明人 KOBAYASHI RYOSUKE;KONO MASAKI;TODA YASUO;NOSE KENJI
分类号 H01L21/677;B65G49/06;B65G49/07 主分类号 H01L21/677
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