发明名称 |
SUBSTRATE MOVING APPARATUS, SUBSTRATE CARRYING APPARATUS AND SUBSTRATE IMAGING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate moving apparatus capable of holding relative position relation between a substrate holding position and a substrate height position at an always fixed position by allowing the substrate holding position to smoothly follow position variation when carrying a substrate so that the holding position of the substrate is vertically varied and to provide a substrate carrying apparatus and a substrate imaging apparatus. SOLUTION: The substrate moving apparatus comprising a substrate holding mechanism and a substrate holding mechanism moving mechanism capable of moving the substrate holding mechanism in a flow direction is provided with a substrate holding mechanism/vertical movement mechanism capable of vertically moving the substrate holding mechanism and a vertical movement control means for performing vertical movement control for canceling vertical movement target weight against the substrate holding mechanism/vertical movement mechanism. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2009231717(A) |
申请公布日期 |
2009.10.08 |
申请号 |
JP20080077924 |
申请日期 |
2008.03.25 |
申请人 |
TOPPAN PRINTING CO LTD |
发明人 |
KOBAYASHI RYOSUKE;KONO MASAKI;TODA YASUO;NOSE KENJI |
分类号 |
H01L21/677;B65G49/06;B65G49/07 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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