| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an oxygen concentration measuring method which enables measurement of the concentration of oxygen in a high temperature heat treatment furnace. Ž<P>SOLUTION: A treatment target is heat-treated at 1,400-2,450°C in the presence of at least two kinds of silicon carbides preliminarily measured in mass and different in void volume in the heat treatment furnace of an inert atmosphere and, after heat treatment, the respective mass of the silicon carbides are measured, the changes of the mass before and after the heat treatment of silicon carbides are calculated and the concentration of oxygen when heat treatment of the treatment target is led out of the changes of the mass of the silicon carbides. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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