| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus capable of removing particles and residual liquid chemicals from a substrate surface, efficiently discharging them to the outside of a processing tank, shortening the processing time and reducing the using amount of processing liquid, in the apparatus for holding a plurality of substrates by a substrate holding means and immersing them in the processing liquid inside the processing tank and processing them. Ž<P>SOLUTION: The apparatus includes: the processing tank 10 for storing the processing liquid; a substrate holder 12 provided with a first holding part 34, a second holding part 36a and a third holding part 36b for respectively holding the lowest end part and respective lower end parts on both sides of the plurality of substrates W arrayed in a horizontal direction in a vertical posture, and moved in the vertical direction between the inner position and upper position of the processing tank 10; a pair of discharge pipes 18 for discharging the processing liquid from a discharge port provided near the bottom part of the processing tank 10; and a movement control means for moving, inside the processing tank 10, the substrate holder 12 to a position at which the second holding part 36a and the third holding part 36b are exposed to the processing liquid from the discharge port of the discharge pipes 18 and a position at which they are not exposed thereto. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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