| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can enhance a cleaning performance while simplifying the arrangement of the apparatus. <P>SOLUTION: The substrate processing apparatus includes a substrate holder 1 for holding a substrate W in a horizontal attitude, a cleaning brush 7 for cleaning the substrate W with the brush contacted with the substrate W, two-fluid nozzle 9, provided at a side of the cleaning brush 7, for cleaning the substrate by ejecting a drop of a processing solution against the substrate together with a carrier gas, a holding arm 5 for holding the cleaning brush 7 and the two-fluid nozzle 9, and a single arm moving mechanism, provided to be linked to the holding arm 5, for moving the cleaning brush 7 and the two-fluid nozzle 9 along a surface of the substrate W. Since the substrate processing apparatus having such an arrangement includes the single arm moving mechanism for moving the cleaning brush 7 and the two-fluid nozzle 9, the arrangement of the apparatus can be simplified and a cleaning performance thereof can be further enhanced. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
