发明名称 |
Ion source and plasma processing apparatus |
摘要 |
It is an object of this invention to provide an ion source and a plasma processing apparatus capable of generating stable and long-life plasma. The ion source is provided with a high-frequency antenna (16) installed on the outer peripheral side of a partition wall (15) made of a dielectric material and partitioning a plasma generating chamber (14) and a shield body (26) made of a dielectric material and preventing deposition on the inner peripheral surface of the partition wall (15) facing the high-frequency antenna (16) inside the plasma generating chamber (14). The structure made of a dielectric material can prevent an increase in high-frequency power required for inductive coupling with plasma. The shield body (26) is formed with a slot (26a) in a direction crossing a winding direction of the high-frequency antenna (16). Since this arrangement can prevent continuous deposition on the inner surface of the partition wall in the winding direction of the high-frequency antenna, an induction loss between the high-frequency antenna and the plasma generating chamber can be effectively prevented even if the deposited film is made of a conductive material.
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申请公布号 |
US2009250340(A1) |
申请公布日期 |
2009.10.08 |
申请号 |
US20060990787 |
申请日期 |
2006.09.07 |
申请人 |
SASAKI NARUYASU;SHIMIZU SABUROU;KUNIBE TOSHIJU |
发明人 |
SASAKI NARUYASU;SHIMIZU SABUROU;KUNIBE TOSHIJU |
分类号 |
C23C14/34;C23C16/00 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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