| 摘要 |
<p>In EUV lithography apparatuses (10) purged with hydrogen it is suggested that components including hydrogen-sensitive material be arranged within a protection module (24, 29, 32) to increase their useful life. The protection module (24, 29, 32) has a housing with at least one opening, in which at least one component is arranged, wherein one or more gas inlets (23, 30, 33) are provided to introduce a gas flow into the housing, which exits through the at least one opening.</p> |
