| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a Te-based sputtering target for forming the film of an optical recording medium with reduced particle production during sputtering. <P>SOLUTION: In a Te-based sputtering target for forming the film of the optical recording medium, having a component composition represented by (Te<SB>x</SB>Pd<SB>y</SB>)<SB>a</SB>(TeO<SB>2</SB>)<SB>b</SB>(wherein, 30≤y≤60; x=100-y; 50≤b≤70; and a=100-b, in terms of atomic percentage), the Te-based sputtering target is composed of a mixed phase comprising a TePd alloy phase and a TeO<SB>2</SB>phase, having a composition that Te is contained in an amount of 30-60 atom% and the remainder is composed of Te and inevitable impurities; wherein the average particle diameter of the TePd alloy phase is 5-15 μm; the average particle diameter of the TeO<SB>2</SB>phase is 5-15 μm, and the ratio of the average particle diameter of the TePd alloy phase to the average particle diameter of the TeO<SB>2</SB>phase ((the average particle diameter of the TePd alloy phase)/(the average particle diameter of the TeO<SB>2</SB>phase)) lies in a range of 0.5-1.5. <P>COPYRIGHT: (C)2010,JPO&INPIT |
