发明名称 METHOD OF CORRECTING SCAN EXPOSURE EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To reduce lapped deviation errors such as patterns. <P>SOLUTION: A control section 2a computes a compensation factor of a correction formula which carries out an alignment degradation to the n-th order of more than the 5-th order as the compensation factor of a distortion shape in a shot and/or the compensation factor between distortion shape shots in the shot, and corrects a distortion error every shot (S6, S7). Thereafter, exposure equipment inputs requested parameters and carries out an exposure (S8). <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009231564(A) 申请公布日期 2009.10.08
申请号 JP20080075624 申请日期 2008.03.24
申请人 TOSHIBA CORP;CHUBU TOSHIBA ENGINEERING KK 发明人 TAKAKUWA MAHO;OGAWA YOSHIAKI
分类号 H01L21/027;G03F9/00 主分类号 H01L21/027
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