摘要 |
An actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other. |
申请人 |
FUJIFILM CORPORATION;FUJII, KANA;TOMIGA, TAKAMITSU;TSUCHIHASHI, TORU;MIZUTANI, KAZUYOSHI;YOKOYAMA, JIRO;SUGIYAMA, SHINICHI;HIRANO, SHUJI;FUJIMORI, TORU |
发明人 |
FUJII, KANA;TOMIGA, TAKAMITSU;TSUCHIHASHI, TORU;MIZUTANI, KAZUYOSHI;YOKOYAMA, JIRO;SUGIYAMA, SHINICHI;HIRANO, SHUJI;FUJIMORI, TORU |