| 摘要 |
In order to provide a substrate for thin film solar cell which is inexpensive and excellent in electrical and optical performance in comparison to a conventional substrate for thin film solar cell (transparent electrode), a substrate for thin film solar cell of a novel structure and a device and method relating to manufacture thereof are provided. A high-frequency plasma CVD device made from an organic metallic material laminates a transparent electrode film consisting of a three-layer structure of an amorphous titanium oxide film, a crystalline titanium oxide film, and a crystalline zinc oxide film on a transparent insulation substrate. This makes it possible to manufacture the substrate for thin film solar cell which is inexpensive, has an optical confinement effect (the relief structure of a film), and is highly conductive and highly light-transmissive.
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