| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a magnetic control sputtering target structure and equipment which uniformize the wear of a target material and improve the durability of the target material. Ž<P>SOLUTION: The magnetic control sputtering target structure comprises a drive device, at least two rotation shafts and a plurality of magnetic bars, wherein the drive device is twisted on the rotation shaft to form a drive device type drive structure, and the magnetic bars are arrayed on the drive device in parallel. The magnetic control sputtering target equipment comprises the magnetic control sputtering target structure, and also comprises a target material which is arranged on the outer side of the drive device type drive structure. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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