发明名称 Field-effect transistor structure and fabrication method thereof
摘要 A field-effect transistor (FET) structure is provided. The FET structure includes a gate substrate, a dielectric layer, conductive electrodes, and a carbon nanotube (CNT). The gate substrate is made of a conductive material. The dielectric layer is disposed on the substrate. The conductive electrodes are disposed on the dielectric layer, and contain nickel and chromium. The CNT is disposed on the dielectric layer and electrically connects two conductive electrodes
申请公布号 US2009250731(A1) 申请公布日期 2009.10.08
申请号 US20080080505 申请日期 2008.04.02
申请人 YANG TSUNG-YEH;YEW TRI-RUNG 发明人 YANG TSUNG-YEH;YEW TRI-RUNG
分类号 H01L29/00;H01L21/3205 主分类号 H01L29/00
代理机构 代理人
主权项
地址