| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for forming a lower layer film, which can form a resist lower layer film having a function as an antireflective coating, and is improved in pattern transfer performance, etch selectivity and inter-mixing preventive effect. <P>SOLUTION: The composition for forming the lower layer film contains a polymer (A) having as an essential constitutive unit a repeating unit expressed by the general formula (1) (wherein R1 is a hydroxyl group or the like, n is integers from 0 to 6, X is a substitutional 1-20C alkylene group or the like, and m is integers from 1 to 8) and further having another specified repeating unit. <P>COPYRIGHT: (C)2010,JPO&INPIT |
