OXIDE FILM DEPOSITION METHOD AND OXIDE FILM MEMBER

摘要

PROBLEM TO BE SOLVED: To provide an oxide film deposition method and an oxide film member for depositing a metal oxide thin film on the projection and recessed face, in the crack or the like of a surface of a substrate.

SOLUTION: A Y2O3film is deposited on an aluminum oxide (Al2O3) sintered body substrate 10 by using an air-open type CVD method using an air-open type CVD apparatus. An yttrium oxide film can be synthesized along a base material by using Y(DPM)3as a starting material of the Y2O3film. Any unevenness of the surface of the substrate can be uniformized, and the deepest part of grain boundary cracking or the like can be filled by the vapor deposition of the yttrium oxide film.

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