POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN

摘要

A positive resist composition including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a1) derived from hydroxystyrene, a structural unit (a2) represented by general formula (a2-1) or (a2-2) shown below, and a structural unit (a3) represented by general formula (a3-1) or (a3-2) shown below.