CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE

摘要

In order to enable a more gentle cleaning of the optical elements of an EUV lithography device, a cleaning module for an EUV lithography device is suggested with a supply (206) for molecular hydrogen, a heating filament (210) and a line (212) for atomic and/or molecular hydrogen, in which cleaning module the line (212) has at least one bend with a bending angle of less than 120 degrees, the line (212) has a material on its inner surface which has a low recombination rate for atomic hydrogen and the supply (206) is of flared shape at its end which faces the heating filament (210). A gentler cleaning can also be achieved by exciting a cleaning gas by means of a cold cathode or a plasma as well as by filtering out charged particles by means of electrical and/or magnetic fields.