发明名称 HOLDER FOR SEMICONDUCTOR PRODUCTION SYSTEM
摘要 A holder for semiconductor production system in which occurrence of leak and spark is prevented in an electrode terminal and a lead wire for supplying power to a resistance heating element buried in the holder and soaking properties within±1.0% can be attained in the holder. The holder for semiconductor production being disposed in a chamber supplied with reaction gas, comprises a ceramic holder (1) for holding material being processed (10) on the surface and incorporating resistance heating elements (2) for heating the materials being processed, and a supporting member (6) having one end for supporting the ceramic holder (1) at a part other than the surface for holding the material and the other end secured to the chamber, wherein the electrode terminal (3) and the lead wire (4) of the resistance heating element (2) provided at a part of the ceramic holder (1) other than the surface for holding the material are housed in an insulating tube (5).
申请公布号 KR20090104122(A) 申请公布日期 2009.10.05
申请号 KR20097017661 申请日期 2003.03.06
申请人 发明人
分类号 H01L21/683;H01L21/00;H01L21/31;H01L21/687 主分类号 H01L21/683
代理机构 代理人
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