Producing device e.g. sensor with cavities filled with a fluid and closed by a layer, comprises preparing a stack covered with a layer made of a first sealing material on a support, and preparing the patterns defining walls in the stack

摘要

The process comprises preparing a stack covered with a layer made of a first sealing material on a support (100), preparing the patterns defining walls of the cavities in the stack, filling the cavities with a liquid, closing the cavities using a closing layer (150), contacting the sealing layer on the cavity walls, and sealing the closing layer with the first sealing material. The closing layer comprises a sub layer made of a second sealing material deposited on the cavity walls. The second sealing material is etched according to the same pattern as the walls. The process comprises preparing a stack covered with a layer made of a first sealing material on a support (100), preparing the patterns defining walls of the cavities in the stack, filling the cavities with a liquid, closing the cavities using a closing layer (150), contacting the sealing layer on the cavity walls, and sealing the closing layer with the first sealing material. The closing layer comprises a sub layer made of a second sealing material deposited on the cavity walls. The second sealing material is etched according to the same pattern as the walls. The cavities are closed by contacting the etched patterns of a second sealing material with the walls. The first sealing material and the second sealing material are photosensitive materials, sealed and permeable against the liquids. The support comprises a polyethylene terephthalate (PET) layer. The stack is formed on the PET layer. The primary sealing and/or second sealing material are a polymer material, which is polymerized by UV radiation and heat treatment. The walls are prepared by depositing a layer of hard mask on the stack, depositing a photosensitive resin layer of hard mask layer, producing a pattern similar to patterns of walls in the photosensitive resin layer, transferring the first pattern in the first layer of hard mask, and reproducing the first pattern in the stack by etching through the hard mask. A layer of structural material is formed on the support before producing the layer made of the first sealing material, where the structural material is a UV polymerizable material.