发明名称 IMAGE SAMPLING DEVICE AND SAMPLE INSPECTION DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an image sampling device and sample inspection device for preventing disturbance, especially for blocking radiation such as cosmic rays. <P>SOLUTION: The image sampling device and sample inspection device include a light source for irradiating a sample having a pattern, a sensor for receiving the light radiated from the light source to the sample and sampling a pattern image, an optical path changing body that is arranged in front of the sensor and bends an optical path, and a blocking body that surrounds the optical path and blocks the radiation coming into the sensor. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009222623(A) 申请公布日期 2009.10.01
申请号 JP20080068917 申请日期 2008.03.18
申请人 ADVANCED MASK INSPECTION TECHNOLOGY KK 发明人 HIRANO RYOICHI
分类号 G01N21/956;G03F1/84;H01L21/027;H01L21/66 主分类号 G01N21/956
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