The invention comprises a device and method for surface cleaning of individual wafers or substrates arranged in a stack along a stacking direction, where a jet of fluid is sent towards the stack in a direction perpendicular to the stacking direction and it is provided a relative movement between the wafer stack and the nozzle in the stacking direction.
申请公布号
WO2009091264(A3)
申请公布日期
2009.10.01
申请号
WO2009NO00019
申请日期
2009.01.15
申请人
REC SCANWAFER AS;WANG, PER, ARNE;RAMSLAND, ARNE;TRONRUD, OLE, CHRISTIAN;HJERTAAS, ERIK;HAMMEL, BENT;SKEIE, ANDRE;TRONRUD, OLA
发明人
WANG, PER, ARNE;RAMSLAND, ARNE;TRONRUD, OLE, CHRISTIAN;HJERTAAS, ERIK;HAMMEL, BENT;SKEIE, ANDRE;TRONRUD, OLA
