| 摘要 |
<p>The present invention relates to plasma cleaning apparatuses for cleaning semiconductor components (a cleaning object or a PCB board) with plasma discharge in a semiconductor fabrication process. More specifically, the present invention relates to a semiconductor plasma cleaning apparatus with cleaning chambers (100) for improving working efficiency by making continuous plasma cleaning of cleaning objects placed in magazines. The semiconductor plasma cleaning apparatus having a plurality of cleaning chambers (100), includes the plurality of cleaning chambers (100) arranged in parallel vertically, an unloading unit (200) movable in up/down direction according to a cleaning progress Situation for transferring magazines having cleaning objects loaded thereon to front of each of the cleaning chambers (100) in succession, a plurality of first pushers (250) mounted to the unloading unit (200) for pushing and discharging the cleaning object loaded in the magazine being transferred by the unloading unit (200) toward the cleaning chamber one by one, a rotatable transfer unit (300) for receiving an empty magazine having all the cleaning objects discharged from the unloading unit (200), rotating the empty magazine by 180 horizontally, and transferring the empty magazine to rear of the plasma cleaning chamber, a loading unit (400) for receiving the empty magazines from the rotatable transfer unit (300), and transferring the empty magazines to rear of each of the plasma cleaning chambers (100) in succession while moving from an lower side to an upper side according to the cleaning progress situation, and a second pusher (500) for pushing and loading the cleaning objects having cleaning thereof finished into the empty magazine at the loading unit (400).</p> |
