PATTERN INSPECTING DEVICE, METHOD AND PROGRAM FOR INSPECTING PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a device for inspecting a pattern, capable of producing a reference image which is closer to a real image.

SOLUTION: The device 100 for inspecting a pattern includes a magnification converter 50 for converting sample optical image data into that with N-magnification resolution; an LPF 54 for convolving design image data that defines a gray scale value, corresponding to N-magnification resolution of the sample optical image data and a predetermined low-pass filtration function; a PSF56 for convolving this design image data and a predetermined optical model function; a coefficient acquisition section 142 for acquiring the coefficient of an optical model function using these image data; an optical image acquisition section 150 for acquiring the real optical image data of an object to be inspected that is pattern-formed; a reference circuit 112 for producing reference image data corresponding to the real optical image data of the object to be inspected using the coefficient; and a comparison circuit 108 for comparing the real optical image data and the reference image data.

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